Sony MLS-X1 Users Guide - Page 150

Mix Positive NAM Negative NAM You can adjust the pattern mix using the parameters. When mix, positive NAM, or negative NAM is selected: Set the proportion of the sub pattern relative to the main pattern (0.00% to 100.00%) using the [Mix Ratio] parameter. When morphing is selected: Set the position of the transition where the main pattern is 100% using the [Start] parameter, and the position of the transition where the sub pattern is 100% using the [End] parameter. • Set a value in the range -50.00 to 150.00. A value of 0.00 corresponds to the start of the transition, and a value of 100.00 corresponds to the end of the transition. • A negative [Start] value signifies that main and sub pattern mixing has begun when the transition starts. • An [End] value of greater than 100.00 signifies that the main and sub patterns are still mixing when the transition ends. • If the [Start] and [End] values are the same, the main and sub patterns are interchanged instantaneously at a specified point in the transition. • If the [End] value is less than the [Start] value, the transition progress is from the sub pattern to the main pattern. Dust mix You can apply a diamond dust wipe effect to a selected wipe pattern. The selected pattern and diamond dust wipe pattern are mixed, so this is the same effect obtained as a pattern mix when the diamond dust pattern is selected for the sub pattern. You can also apply the diamond dust wipe effect to the pattern created by a pattern mix. Note When a diamond dust wipe (pattern number 274) is selected, the dust mix effect is not applied. Relationship between main pattern and sub pattern Sub patterns may not be available for some patterns, depending on the selected main pattern. A pattern mix cannot be configured for the following combinations of main pattern and sub pattern. • When the main pattern or sub pattern is a rotary wipe • When both the main pattern and sub pattern are mosaic wipes • When both the main pattern and sub pattern are random/diamond dust wipes If the main pattern and sub pattern are in a combination for which a pattern mix cannot be set, the sub pattern changes to pattern number 1. Main pattern and sub pattern modifier link It is possible to link the modifier settings for the main pattern and sub pattern. The following two link modes are available. Full link mode All modifier settings are the same for the main pattern and sub pattern. Changing the modifiers for one pattern also changes the modifiers for the other pattern. Semi link mode Only the parameter adjustments of the modifiers are linked. The modifier enable/disable settings are not linked. When the parameter values of the same modifiers for the main pattern and sub pattern are different and semi link mode is selected, changing the value of the parameter for one pattern also changes the value of the parameter for the other pattern to maintain the same difference between the two. Note When executing a wipe transition using a pattern mix, it is recommended that you set the modifier link function to full link mode. If the modifier link function is disabled or semi link mode is selected, the desired image may not be obtained at the start or end of the transition. Setting a pattern mix This section describes the M/E-1 menu as an example. 1 Open the Home > M/E-1 > Bus/Transition > Wipe > Main Pattern menu (11109.31) and select a main pattern. For details, see "Selecting a wipe pattern" (page 149). 2 Open the Home > M/E-1 > Bus/Transition > Wipe > Sub Pattern menu (11109.32) and select a sub pattern. 150